Plasma characterization and modelling for c-Si solar cells thin film deposition
In this work, plasmas produced during thin film deposition are characterized. Optical emission spectroscopy (OES) is used to extract the plasma parameters in a silane and ammonia gas mixture. The coupling of OES results with a global plasma model allowed us to calculate the different species densities. Finally, the deposited silicon nitride properties are related to the plasma characterization results.
In this work, plasmas produced during thin film deposition are characterized. Optical emission spectroscopy (OES) is used to extract the plasma parameters in a silane and ammonia gas mixture. The coupling of OES results with a global plasma model allowed us to calculate the different species densities. Finally, the deposited silicon nitride properties are related to the plasma characterization results.
| Autor: | Rachdi, Lazhar |
|---|---|
| ISBN: | 9783839618219 |
| Sprache: | Englisch |
| Seitenzahl: | 344 |
| Produktart: | Kartoniert / Broschiert |
| Verlag: | Fraunhofer Verlag |
| Veröffentlicht: | 05.07.2022 |
| Schlagworte: | Energiequellen und Technologien Fraunhofer ISE Photovoltaic engineers Physik der kondensierten Materie Plasmaphysik Technologie der Oberflächenbeschichtung plasmascientists |